项目概况: 中兴研发大楼为高科技企业中兴通讯的研发基地,其位于深圳市科技园南区,
南面紧邻中兴通讯一期办公楼。
总建筑面积65569.5平方米,建筑用地面积12410.80平方米,建筑占地面积1651.55平方米。
建筑总高度153.80米,地下2层,地上36层,是一座现代化的超高层建筑。
project place: shenzhen, guangdong
briefs: the building is the research base of the high-tech enterprise – zet communication, it’s located in south of
shenzhen technology park, on the south is the zte office building.
the total building area 65569.5㎡, occupied area 12410.8㎡, the building occupied area 1651.55㎡. the
building is 153.8 meters high skyscrapers with 2 floors underground and 46 floors overground.